Here are the highlights from Session Nine “Productivity / Cost of Ownership (COO)” of the 22nd annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Wednesday June 13, 2012.
Teruyuki Kitagawa (Nomura Plating, Co., Ltd. – Japan), “Unique Characteristics of the Novel Carbonaceous Film with High Electrical Conductivity and Ultra High Hardness for Semiconductor Test Probes”:
In a follow-up to last year’s presentation, improvements to Nomura’s carbonaceous film were discussed. The film has a much higher hardness (Hv 4000) than palladium (Pd, Hv 350 ~ 400) or even diamond-like carbon (DLC, Hv 1000 ~ 2000) which provides wear resistance and acts as a self cleaning surface. The significant improvement since last year is Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Session 9 (Wednesday)”