Category: Statistical Process Control (SPC)

IEEE Semiconductor Wafer Test Workshop – Optimization / Process Analysis – Session Two (Monday)

Here are the highlights from Session Two – “Optimization / Process Analysis” of the 21st annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Monday June 13, 2011.

Steven Ortiz, Avago, “Probe to Pad Placement Error Correction for Wafer Level S-Parameter Measurements”:

Avago’s film bulk acoustic resonators (FBAR) technology usage is being expanded from filters to include oscillators. The example oscillator discussed operates at a 1.5 GHz resonant frequency with a Quality (Q) factor ranging from one thousand to several thousand and a one year aging specification of less than 25 ppm.

These devices are extremely difficult to test due to their precision and small size (not much larger than the two device pads). The drift specification is the hardest to measure. Since it is generally desirable to have at least 10x measurement capability, the drift measurement requires approximately 2.5 ppm of tester performance, i.e. 3.75 KHz accuracy at 1.5 GHz. They use Continue reading “IEEE Semiconductor Wafer Test Workshop – Optimization / Process Analysis – Session Two (Monday)”