Many exotic materials or materials with special properties are processed using extreme temperature and pressure often with toxic starting materials. In semiconductors, molecular beam epitaxy (MBE) to build single crystal structures and sputtering are common methods of physical deposition to deposit thin films. Both are done using a very high vacuum. MBE heats the atomic materials until they sublimate and land on the desired surface. Sputtering uses a gas plasma to knock a few atoms of material off a “target” and onto the desired surface. There are also different chemical deposition processes including electroplating which uses metal salts dissolved in a solution bath, chemical vapor deposition (CVD) which uses high vacuum, and atomic layer deposition (ALD) which is similar to CVD but uses two half-reactions of gas phase precursors.
Limitations imposed by extreme temperature, extreme pressure, and toxic materials combined with a typically slow deposition rate make it is difficult to economically run these processes on an industrial scale for high volume manufacturing. But what if there was a process that Continue reading “Green on the Industrial Scale”
The IEEE San Francisco Bay Area Nanotechnology Council held their 7th annual symposium this week. As in the past, the council presents an excellent program. This year’s program focused was “Nanotechnology – Consumer Applications.”
Here are my notes from the keynote presentation by Dr. Spike Narayan, Functional Manager IBM, “Nanotechnology: Leveraging Semiconductor Technologies to Address Global Challenges.”
He asks: can we leverage semiconductor technology to address global challenges of environment, energy, healthcare, and water? Others have made a compelling argument that Continue reading “IEEE Nanotechnology Symposium 2011 – Keynote”