IEEE Semiconductor Wafer Test Workshop 2012 – Session 5 (Tuesday)

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Here are the highlights from Session Five “New Probe Card and Contact Technologies” of the 22nd annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Tuesday June 12, 2012.

Tsutomu Shoji (Japan Electronics Materials Corp. ‐ Japan) and Takashi Naito (Advantest ‐ Japan), “Full Wafer Contact Breakthrough with Ultra‐High Pin Count”:

Awarded Best Overall Presentation

As the number of probes on probe cards increase due to greater parallelism, driven by the desire for one touchdown testing and the future transition to 450 mm wafers, the total force required to probe a wafer increases if there is no reduction in the force per probe. This wafer prober chuck needs to apply the required force by pushing the wafer against the probe card typically held in place by the structure of the prober. With 200K probes on a 450 mm wafer each requiring 5 gF this is approximately equal to 1 ton (2205 lbF) of applied force. To reduce these force requirements wafer chuck and prober structure, Advantest and JEM have Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Session 5 (Tuesday)”

IEEE Semiconductor Wafer Test Workshop 2012 – Session 4 (Monday)

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Here are the highlights from Session Four “New Contactor Technologies and RF PCB Design” of the 22nd annual IEEE 
Semiconductor Wafer Test Workshop (SWTW) from Monday June 11, 2012.

A last minute change to balance the schedule moved my paperThe Road to 450 mm Semiconductor Wafers” from the previous session:

Many believe that Gordon Moore in his famous 1965 paper “The Experts Look Ahead: Cramming More Components onto Integrated Circuits” that has become know as Moore’s Law, said that the number of transistors on a device would double every year (later revised to every two years). He did not say quite that. What he said was  Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Session 4 (Monday)”

IEEE Semiconductor Wafer Test Workshop 2012 – Session 3 (Monday)

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Here are the highlights from Session Three “Probe Potpourri” of the 22nd annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Monday June 11, 2012.

Larry Levy (FormFactor, Inc.), “Is Parametric Testing About To Enter a Period of Growth and Innovation?”:

Upwards of one thousand facilities perform parametric wafer testing (based on 2009 market data) with over a third of these using obsolete test equipment. There have been no really new testers in several years – Agilent still has their 40xx series and Keithley has their S530 tester. And several companies have exited the market and some companies (including Keithley) are no longer supporting older models of testers. Since parametric testing remains an essential process, this has forced a high number of these facilities to use obsolete equipment or find other approaches. A few companies are going as far as using an Advantest 93000, a significantly more expensive and highly sophisticated digital tester, for parametric test. [Updated to clarify Keithley’s status.]

Parametric testing can be divided into three categories: in-line, end of line (EOL), and quality and reliability. In-line testing is  Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Session 3 (Monday)”

IEEE Semiconductor Wafer Test Workshop 2012 – Session 2 (Monday)

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Here are the highlights from Session Two “Optimizing Probe Depth Performance” of the 22nd annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Monday June 11, 2012.

Tommie Berry (FormFactor, Inc.), “Actual vs. Programmed Over Travel for Advanced Probe Cards”:

As the number of probes on a probe card increase, the total force required to compress these probes – know as probe force – is increasing. With high force the actual over travel (AOT) – also know as overdrive – of the probe is often significantly different than the programmed over travel (POT) programmed in the prober. Even though memory test engineers with very high probe count cards have Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Session 2 (Monday)”

IEEE Semiconductor Wafer Test Workshop 2012 – Welcome & Session 1 (Monday)

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Here are the highlights from the Welcome and Session One “Process Improvements for HVM” of the 22nd annual IEEE Semiconductor Wafer Test Workshop (SWTW) from Monday June 11, 2012.

Jerry Broz (SWTW general conference chair) started with several sets of numbers: SWTW attendance (up), semiconductor revenue and wafer statistics (problems). and probe card market (up). The problem with semiconductor statistics are  Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Welcome & Session 1 (Monday)”

IEEE Semiconductor Wafer Test Workshop 2012 – Opening Session & Keynote (Sunday)

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This year’s IEEE Semiconductor Wafer Test Workshop started on Sunday June 10th with a pleasant surprise. Due to a welcomed but unexpected wave of seventy walk-in registrations, there was insufficient seating at the opening dinner. Thankfully the hotel staff quickly adjusted to accommodate these additional guests. Attendance and interest in this year’s workshop was clearly up.

Jerry Broz, general conference chair, welcomed everyone with a brief overview and presented prizes for the first annual golf tournament. We then quickly proceeded with business as Matt Nowak (Senior Director, Advanced Technology, Qualcomm CDMA Technologies) provided the keynote “Emerging High Density 3D Through Silicon Stacking (TSS) – What’s Next?” Mr. Nowak discussed the increased amount of hype within the 3D semiconductor packaging market in the last year with everyone announcing something. And Thru Silicon Vias (TSVs) technology has already been in high volume production for image sensors for several years now but at a significantly lower density than for 3D packaging.

Why the great interest recently in 3D packaging using TSVs today? Three simple reasons:  Continue reading “IEEE Semiconductor Wafer Test Workshop 2012 – Opening Session & Keynote (Sunday)”

Semiconductor Wafer Test Technology and Trends: Lessons for MEMS Test Engineers

Lessons for MEMS Test Engineers
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The MEMS Testing and Reliability 3rd Annual Conference gets high marks: excellent speakers focused on an emerging topic and it was large enough to have “critical mass” while allowing everyone to interact. It was well produced by MEMS Investor Journal and MEPTEC.

My presentation, “Semiconductor Wafer Test Technology and Trends: Lessons for MEMS Test Engineers“, covered the differences between testing semiconductors and microelectromechanical systems (MEMS). I reviewed the progress in test technology over the last fifty plus years, from simple cantilever probe cards to large full wafer contact probe cards, developed to reduce the cost of test.

I discussed lower cost solutions that appear counter-intuitive since they require increased technical and operational complexity. Challenges of testing MEMS devices while still on wafer (prior to packaging and singulation) were discussed along with a review of MEMS solutions at this year’s IEEE Semiconductor Wafer Test Workshop.

With the proper skills, experience, and perspective it is possible to avoid “re-inventing the wheel” and to develop the best strategy to profitably introduce new technologies to high volume manufacturing.